Inductively coupled plasma atomic emission spectrometry (ICP-OES) is an analytical technique that allows the quantification of elements up to the trace level in samples in solution. The sample to be analyzed is nebulized and conducted to an argon plasma, where desolvation, vaporization, atomization and ionization of the elements take place. The atoms and ions reach an excited state by the high thermal energy supplied by the plasma and during the relaxation process electromagnetic radiation is emitted with wavelengths characteristic of each element. The intensity of the different emission lines is proportional to the concentration of the elements, which can be quantified by using appropriate calibration curves. This technique has high detection limits (in the ppb range, μg / L), good reliability, high throughput and multi-elemental capacity, although in some cases spectral interferences can occur due to a high number of emission lines.

Solid samples (digestion will be carried out by the service) or liquid samples in slightly acidic aqueous solution can be supplied. Samples in HF medium are not allowed. Liquid samples must not present precipitates or colloids in suspension and must have a minimum volume of 10 ml. The samples will be delivered to the technician in charge of the service, together with the duly completed analysis request that is available on the ICMS website.

Available Equipment

• iCAP 7200 ICP-OES Duo (ThermoFisher Scientific)
• Microwave Digestion System ETHOS EASY (Milestone)

The ICMS electroluminescence spectroscopy service allows full characterization of current-activated photoemission from an emitting device. The service has an integrating sphere with a port that houses the electroluminescent device connected to a CCD detector. A module for angular characterization of the electroluminescent device is also available. The measurements allow to obtain the luminance vs current density curves or vs potential and the quantum efficiency of electroluminescence.  

Available Equiment

• Measuring EQE System: C9920-12
• Light Brightness Distribution: C9920-11

Reserva on-line

he Ultraviolet-Visible-Near Infrared Spectroscopy (UV-Vis-NIR) reports on the existing energy differences be-tween the more external occupied electronic levels and the nearer unoccupied ones.

There are two equipments in the laboratory, which work in the wavelength range of 190 nm to 900 nm. It can operate in the Transmission mode or in Diffuse Reflectance Modes.

Available Equipment

• Cary 5000+UMA (Universal Measurement Accessory)
• Cary 300

The ultra-fast spectroscopy laboratory allows performing time-resolved absorption and emission measurements with a time resolution of 190 femtoseconds (fs) over a broad temporal range (190 fs - 1 millisecond). Measurements can be carried out in the 350-850nm spectral range. 

Instrumental disponible

• Sistema de excitación láser ultra-rápido formado por un láser pulsado PHAROS (Light Conversion) (longitud de onda de emisión 1030nm, tasa de repetición 1kHz y duración de pulso 190fs) y un amplificador paramétrico (OPA) ORPHEUS (Light Conversion) que produce pulsos de duración y tasa de repetición iguales al PHAROS pero con una longitud de onda sintonizable en el rango 350-2500nm.
• Espectrómetros de absorción para el rango temporal 190fs-8ns (HELIOS, Ultrafast Systems) y 2ns-1ms (EOS, Ultrafast Systems). Ambos sistemas permiten realizar medidas en el rango espectral 350-1100nm con una resolución de 2nm.
• Espectrómetro de emisión para el rango temporal 190fs-5ns (HALCYONE, Ultrafast Systems) oeprativo en el rango espectral 350-1100nm.
• Sistema de time-correlated single-photon counting (TCSPC) para realizar medidas de emisión resuelta en el tiempo en el rango temporal 1ns-1ms y en el rango espectral 200-850nm.

Typically, “photoelectron spectroscopies” are a powerful set of non-destructive analysis techniques, exclusively sensitive to the more superficial few atomic layers (20-30 Å), allowing to obtain valuable information about their chemical, physical and electronic properties.

The technical interest of the resulting information is huge in fields such as catalysis, corrosion, surface treatments,, floating and adhesion phenomena, or segregation processes, among others. The most remarkable characteristic of X-Ray Photoelectron Spectroscopy (XPS/ESCA) is that it allows to discriminate, for a given element, between different oxidation states or chemical surroundings (coordination).
 

Available Equipment
Photoelectron Spectrometer PHOIBOS 100-DLD, consisting on:

• Analysis Chamber, equipped with a hemispheric multichannel analyser PHOIBOS 100-DLD, a four axis manipulator, a dual X-ray source (achromatic Al Kα, Mg Kα), a UV lamp, and a electron gun, allowing to perform surface analysis by XPS, UPS, ISS and REELS, including angular resolved studies.
• Two prechambers for different treatments, with ultimate vacuum levels of 10-8 and 10-9 mbar respectively, where samples can be subjected to diverse treatments and transferred to the analysis chamber without exposure to the atmosphere. The possible treatments include heating at high temperature (< 800C) under controlled atmosphere, ion sputtering with inert or reactive gases, exposure to plasma, laser treatments, deposition of metals, oxides or simple compounds, exfoliation, etc.

Photoelectron Spectrometer SPECS, consisting on:

• Analysis Chamber, equipped with a hemispheric multichannel analyser PHOIBOS 100, three axis manipulator and dual X-ray source (achromatic Al Kα, Mg Kα).
• Pre-chamber for High Pressure/High Temperature treatments (HPHT Cell).Samples can be subjected to treatments in the presence of gases up to 20 bar and 800ºC (simultaneously). These treatments can be performed either under static or flowing gas conditions. After treatments, samples can be transferred to the analysis chamber without exposure to the atmosphere.
• A Fast entry chamber, equipped with a parking and degassing system, allowing the samples to be evacuated at moderate temperature (T < 150ºC). It is also possible to sputter the samples under an accelerated ion beam (0.5- 5.0 kV) using inert or reactive gases. Incorporation of some other equipment (Visible light illumination, metal evaporators) is also contemplated.

Advanced characterization of wetting using a goniometer to determine the contact angle of liquid droplets deposited on a surface is a quantitative and non-destructive analysis technique in general, depending on the surface reactivity with the wetting liquid. The combination of several liquids allows to determine the surface tension of the wet solid and to estimate the work of adhesion in simulated environments. The control of the wettability of smart surfaces under the action of external stimuli such as the application of light, temperature and/or humidity gradients, changes in pH or electric fields, are of great interest in advanced applications for the aeronautical industry, lines of communication, transportation, protection, heritage, solar and wind energy or biomedicine, among others.

Determination of the contact angle is carried out by applying Young's equation for interfacial tension balance, with sensitivity at the nanometric scale. The tests can be carried out in static or in dynamic modes to obtain hysteresis (advanced and receding angle values) of surfaces and critical values ​​of droplet sliding. Regarding the surface tension of the solid surface, implemented theoretical models are those of Owens, Wendt, Rabel and Kaelble, Extended Fowkes, Schultz and Van Oss&Good and Neumann, based on the existence of polar and dispersive components. In addition, the temporal tracking of the surface contact angle accounts for aging and stability in certain environments. Finally, the assistance of a controlled temperature and humidity chamber allows studies of condensation/evaporation and freezing/thawing of water on surfaces.

The contact angle and surface tension measurement equipment has been supported by the Junta de Andalucía (Aid for R&D infrastructure and equipment 2019-PAIDI2020 European Regional Development Fund)

Available Equipment

DataPhysics OCA 25 Optical Contact Angle Goniometer, consisting of::

• double injection system with liquid drop volume, between nanoliters (close to the state of the art) to tens of microliters, controlled by a magnetic valve for dispensing
• TBU100 tilting platform for studies of droplet sliding on the surface (-5º - 95º)
• sample holder base adjustable in 3 spatial directions
• TPC160 thermoelectric module for temperature control (from -30ºC to 150ºC)
• module for the application of electric field EWP100 in studies of wetting electrostimulation (0-64kV DC/AC, 3-10mm electrode distance)
• HGC30 electro-humidification chamber to control the humidity of the environment (from 5% to 90%)
• SCA 21 software with routine for surface tension estimation (0.01-2000 mN/m)
• front (3250 f/s) and vertical (2450 f/s) optical systems

The KLA G200x nanoindenter enables the evaluation of the mechanical properties in the nanoscale (hardness, Young’s modulus) which results crucial for thin films and surface treatments, discarding the substrate influence. The CSM (Continuous Stiffness Measurement) option allows a continuous measurement of the stiffness as a function of the frequency or penetration. This operational mode results very useful not only for rigid materials as metals, ceramic or alloys, but also for materials with mechanical response dependent on time, like polymers, composites or biomedical. 
The equipment disposes of two actuators (low and high load) that cover forces range up to 50 and 500 mN, respectively.

Additionally, the service includes the possibility of recording the 3D-surface properties by optical and interpherometric microscopy to evaluate the topography and roughness of the initial state of specimens and after being submitted to mechanical and tribological essays.

Available Equipment

• Nanoindenter KLA G200x
• 3D-optical profiler confocal and interferometric SENSOFAR S-Neox

X-ray diffraction allows the qualitative and quantitative identification of crystalline substances and their microstructural and textural characterization.
At present, four independent diffractometers are available in this service, specifically config-ured to analyze the composition, chemical stability, crystallinity and many other properties in polycrystalline samples of a varied nature. Besides ordinary analyses (Θ-2Θ), part of the equipment can perform some advanced studies as:

• Direct monitoring of transformations undergone in materials under heating, such as phase changes, under inert o reactive atmosphere.
• To characterize materials at the nanoscale (1-100 nm) through X-ray scattering at low angles, using the SAXS technique.
• To measure some physical parameters of layers such as density, thickness and surface rough-ness with the reflectometry setup.
• To obtain the diffraction patterns of samples either sensitive to the atmosphere or highly transparent to X-rays (organic compounds) employing the capillary configuration.

Available Equipment

• Diffractometer PANALYTICAL X’PERT PRO with automatic sample charger
• Diffractometer PHILIPS X'PERT with high temperature chamber (1200ºC) ANTON PAAR HTK 1200
• Diffractometer PANALYTICAL X’PERT PRO (reflectometry, SAXS, low angle scattering and capillary)

This Service can supply all types of solid samples with catalytic activity in various processes of industrial, energy and environmental interest.
Samples are supplied at any stage of preparation, with or without pretreatment or even ready to use. It can include their characterization by various physical and chemical techniques.

This is a service essential for the Institute and external drives attached to the same. Because it allows you to improve, modify and adapt the material and scientific equipment to the needs of each researcher and/or research in progress. Even going to the extent of their manufacture on the basis of a specific need. Offering technical advice, design and manufacture of all elements described above.

Equipment available

The service account with hand tools and power tools for the formation of very diverse materials.

With the possibility union of various materials by welding processes that can be performed in the service:

• Brazing with different contributions
• Electric arc welding
• TIG welding on steel

For the processes of machining by chip is has the following machine-tools:

• HAAS machining center,TM 1P
• Vertical milling machine, Fortex FTX-4-FC VARIO
• Vertical drill, ERLO TSAR32
• Conventional lathe PINACHO SC200
• Semi-automatic lathePINACHO SMART TURN180